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    Binary and ternary NiTi-based shape memory films deposited by simultaneous sputter deposition from elemental targets

    , Article Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films ; Volume 23, Issue 5 , 2005 , Pages 1425-1429 ; 07342101 (ISSN) Sanjabi, S ; Cao, Y. Z ; Sadrnezhaad, S. K ; Barber, Z. H ; Sharif University of Technology
    2005
    Abstract
    The most challenging requirement for depositing NiTi-based shape memory thin films is the control of film composition because a small deviation can strongly shift the transformation temperatures. This article presents a technique to control film composition via adjustment of the power supplied to the targets during simultaneous sputter deposition from separate Ni, Ti, and X (e.g., Hf) targets. After optimization of sputter parameters such as working gas pressure, target-substrate distance, and target power ratio, binary Ni100-x Tix thin films were fabricated and characterized by energy dispersive x-ray spectroscopy in a scanning electron microscope (to measure the film composition and... 

    Multi-target sputter deposition of Ni50Ti 50 - XHfx shape memory thin films for high temperature microactuator application

    , Article Sensors and Actuators, A: Physical ; Volume 121, Issue 2 , 2005 , Pages 543-548 ; 09244247 (ISSN) Sanjabi, S ; Cao, Y. Z ; Barber, Z. H ; Sharif University of Technology
    2005
    Abstract
    High temperature shape memory NiTiHf thin films with varying hafnium contents up to 28.7 at.% were fabricated by DC magnetron sputtering using simultaneous sputter deposition from separate elemental targets. The required film composition was achieved by adjusting the power ratio to the targets. The as-deposited films were amorphous; a post deposition annealing was performed at 550 °C to crystallize the films. Two-micron thick films were characterized by energy dispersive spectroscopy in a scanning electron microscope, temperature controlled X-ray diffraction, differential scanning calorimetry, and atomic force microscopy. The results showed that above 10 at.% Hf additions the transformation... 

    Conductor-insulator transition and electronic structure of Ca-doped BiFeO 3 films

    , Article Materials Letters ; Volume 83 , 2012 , Pages 124-126 ; 0167577X (ISSN) Ahadi, K ; Nemati, A ; Mahdavi, S. M ; Sharif University of Technology
    Elsevier  2012
    Abstract
    The electronic conductor-insulator transition in Ca-doped BiFeO 3 films grown by pulsed-laser deposition technique has been investigated. Nature of the transition is resolved to be Mott type through the control of band-filling. Calcium resolved to have colossal effect on enhancing the electrical conductivity of BiFeO 3, but it did not affect band gap of the mother phase perceptibly. UV-visible study yielded band gap of 2.72-2.81 eV (at 300 K) for different concentrations of calcium. Both UV-visible and photoluminescence spectra revealed sub-band gap transitions at 2.17 and 2.38 eV, of which the latter might be ascribed to the oxygen vacancies  

    Visible light photo-induced antibacterial activity of CNT-doped TiO 2 thin films with various CNT contents

    , Article Journal of Materials Chemistry ; Volume 20, Issue 35 , Jun , 2010 , Pages 7386-7392 ; 09599428 (ISSN) Akhavan, O ; Azimirad, R ; Safa, S ; Larijani, M. M ; Sharif University of Technology
    2010
    Abstract
    Carbon nanotube (CNT)-doped TiO2 thin films with various CNT contents were synthesized by sol-gel method for visible light photoinactivation of Escherichia coli bacteria. Post annealing of the CNT-doped TiO2 thin films at 450 °C resulted in anatase TiO2 and formation of Ti-C and Ti-O-C carbonaceous bonds in the film. By increasing the CNT content, the thin films could further inactivate the bacteria in the dark. Meanwhile, as the CNT content increased from zero to 40 wt% the effective optical band gap energy of the CNT-doped TiO2 thin films annealed at 450 °C decreased from 3.2-3.3 to less than ∼2.8 eV providing light absorption in the visible region. Concerning this, visible light... 

    A Study on Optoelectronic Properties of Copper Zinc Tin Sulfur Selenide: A Promising Thin-Film Material for Next Generation Solar Technology

    , Article Crystal Research and Technology ; Volume 56, Issue 7 , 2021 ; 02321300 (ISSN) Ali, N ; Zubair, M ; Khesro, A ; Ahmed, R ; Uddin, S ; Shahzad, N ; Alrobei, H ; Kalam, A ; Al-Sehemi, A. G ; Ul Haq, B ; Sharif University of Technology
    John Wiley and Sons Inc  2021
    Abstract
    Studies on copper zinc tin sulpher selenide (CZTSSe) thin-film material and its applications as a base material are intensively being researched since it is an earth-abundant, inexpensive, flexible, and interesting material for next-generation optoelectronic technologies. Apropos, this study explores and reports the synthesis of CZTSSe thin films and their key optoelectronics characteristics. The reported films are fabricated on a soda-lime glass substrate by using a physical vapor deposition technique, and then annealed from 250 to 450 °C. From the X-ray diffraction analysis, the structure of the as-deposited thin films is found to be amorphous in nature. Annealed thin films of CZTSSe... 

    A study on optoelectronic properties of copper zinc tin sulfur selenide: A promising thin-film material for next generation solar technology

    , Article Crystal Research and Technology ; Volume 56, Issue 7 , 2021 ; 02321300 (ISSN) Ali, N ; Zubair, M ; Khesro, A ; Ahmed, R ; Uddin, S ; Shahzad, N ; Alrobei, H ; Kalam, A ; Al Sehemi, A. G ; Ul Haq, B ; Sharif University of Technology
    John Wiley and Sons Inc  2021
    Abstract
    Studies on copper zinc tin sulpher selenide (CZTSSe) thin-film material and its applications as a base material are intensively being researched since it is an earth-abundant, inexpensive, flexible, and interesting material for next-generation optoelectronic technologies. Apropos, this study explores and reports the synthesis of CZTSSe thin films and their key optoelectronics characteristics. The reported films are fabricated on a soda-lime glass substrate by using a physical vapor deposition technique, and then annealed from 250 to 450 °C. From the X-ray diffraction analysis, the structure of the as-deposited thin films is found to be amorphous in nature. Annealed thin films of CZTSSe... 

    Visible light active Au:TiO2 nanocomposite photoanodes for water splitting: Sol-gel vs. sputtering

    , Article Electrochimica Acta ; Volume 56, Issue 3 , January , 2011 , Pages 1150-1158 ; 00134686 (ISSN) Naseri, N ; Sangpour, P ; Moshfegh, A. Z ; Sharif University of Technology
    2011
    Abstract
    In this study, pure TiO2 and Au:TiO2 nanocomposite thin films are both synthesized using sol-gel and RF reactive co-sputtering methods. Physical and photoelectrochemical properties of the thin films deposited by each method are compared. The optical density spectra and scanning electron microscopy images of the Au:TiO2 films reveal formation of gold nanoparticles in the all nanocomposite films synthesized by two methods. Moreover, the optical bandgap energy of the thin films decreases with addition of Au nanoparticles. X-ray photoelectron spectroscopy indicates that the presence of gold in metallic state and the formation of TiO2 is stoichiometric. The photoelectrochemical properties of the... 

    Pulsed-laser annealing of NiTi shape memory alloy thin film

    , Article Journal of Materials Science and Technology ; Volume 25, Issue 1 , 2009 , Pages 135-140 ; 10050302 (ISSN) Sadrnezhaad, S. K ; Rezvani, E ; Sanjabi, S ; Ziaei Moayed, A. A ; Sharif University of Technology
    Abstract
    Local annealing of amorphous NiTi thin films was performed by using an Nd:YAG 1064 nm wavelength pulsed laser beam. Raw samples produced by simultaneous sputter deposition from elemental Ni and Ti targets onto unheated Si (100) and Silica (111) substrates were used for annealing. Delicate treatment with 15.92 W/mm2 power density resulted in crystallization of small spots; while 16.52 and 17.51 W/mm2 power densities caused ablation of the amorphous layer. Optical microscopy, scanning electron microscopy, X-ray diffraction and atomic force microscopy were performed to characterize the microstructure and surface morphology of the amorphous/crystallized spot patterns