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high-temperature-shape-memory
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Sputter alloying of Ni, Ti and Hf for fabrication of high temperature shape memory thin films
, Article Materials Science and Technology ; Volume 23, Issue 8 , 2007 , Pages 987-991 ; 02670836 (ISSN) ; Sadmezhaad, K ; Barber, Z. H ; Sharif University of Technology
2007
Abstract
In the present paper, the fabrication and characterisation of typical high temperature Ni(Ti+ Hf) alloyed thin films produced by simultaneous sputter deposition from separate elemental Ni, Ti and Hf targets are presented. Film composition, determined by energy dispersive X-ray spectroscopy, was controlled by adjusting the ratio of powers applied to each target. Films deposited at room temperature had an amorphous structure and subsequent annealing at 550°C was carried out in a high vacuum environment, based on crystallisation temperature evaluation by differential scanning calorimetry (DSC). High temperature martensitic transformation, confirmed by DSC and variable temperature X-ray...
Multi-target sputter deposition of Ni50Ti 50 - XHfx shape memory thin films for high temperature microactuator application
, Article Sensors and Actuators, A: Physical ; Volume 121, Issue 2 , 2005 , Pages 543-548 ; 09244247 (ISSN) ; Cao, Y. Z ; Barber, Z. H ; Sharif University of Technology
2005
Abstract
High temperature shape memory NiTiHf thin films with varying hafnium contents up to 28.7 at.% were fabricated by DC magnetron sputtering using simultaneous sputter deposition from separate elemental targets. The required film composition was achieved by adjusting the power ratio to the targets. The as-deposited films were amorphous; a post deposition annealing was performed at 550 °C to crystallize the films. Two-micron thick films were characterized by energy dispersive spectroscopy in a scanning electron microscope, temperature controlled X-ray diffraction, differential scanning calorimetry, and atomic force microscopy. The results showed that above 10 at.% Hf additions the transformation...