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Silica chloride/wet SiO2 as a novel heterogeneous system for the deprotection of acetals under mild conditions [electronic resource]
, Article Phosphorus, Sulfur, and Silicon and the Related Elements ; Volume 178:2667-2670, Issue 12, 2003 ; Pourjavadi, Ali ; Zolfigol, Mohammad Ali ; Bamoniri, Abdolhamid
Abstract
A combination of silica chloride and wet SiO2 was used as an effective deacetalizating agent for the conversion of acetals to their corresponding carbonyl derivatives under mild and heterogeneous condition
Silica chloride/wet SiO2 as a novel heterogeneous system for the deprotection of acetals under mild conditions
, Article Phosphorus, Sulfur and Silicon and the Related Elements ; Volume 178, Issue 12 , 2003 , Pages 2667-2670 ; 10426507 (ISSN) ; Pourjavadi, A ; Zolfigol, M. A ; Bamoniri, A ; Sharif University of Technology
Taylor and Francis Ltd
2003
Abstract
A combination of silica chloride and wet SiO2 was used as an effective deacetalizating agent for the conversion of acetals to their corresponding carbonyl derivatives under mild and heterogeneous condition
Mild and heterogeneous oxidation of urazoles to their corresponding triazolinediones via in situ generation Cl+ using silica sulfuric acid/KClO3 or silica chloride/oxone system
, Article Catalysis Communications ; Volume 8, Issue 3 , 2007 , Pages 256-260 ; 15667367 (ISSN) ; Bagherzadeh, M ; Mallakpour, S ; Chehardoli, G ; Kolvari, E ; Ghorbani Choghamarani, A ; Koukabi, N ; Sharif University of Technology
2007
Abstract
A combination of silica sulfuric acid and potassium chlorate or oxone® and silica chloride in the presence of wet SiO2 was used as an effective oxidizing agent for the oxidation of urazoles and bis-urazoles to their corresponding triazolinediones under mild and heterogeneous conditions with moderate to excellent yields. © 2006 Elsevier B.V. All rights reserved