Sharif Digital Repository

In this article, we have studied the properties (especially water repellency) of cotton coated by a thin layer of aluminum. The process has been performed in a low temperature plasma medium, using a magnetron sputtering device. We have also investigated the effect of different gases such as argon and oxygen as the discharge medium on the properties of the obtained samples. The results which are exposure time dependent show a good repellent property for 30 min of treating in argon medium under the condition of our experiment. However, when O2 is used in the system, the cotton property changes to become hydrophilic of which the factor decreases as we increase the time of treating. © 2006... 

NiTiHf thin films with varying hafnium contents up to 28.7at% were fabricated using simultaneous sputter deposition from separate Ni, Ti, and Hf targets onto unheated substrates. The required film composition was achieved by adjusting the power ratio to the targets. The as-deposited films were amorphous; and post deposition annealing was performed at 550°C, slightly above their crystallization temperatures. The crystallization temperature of the films varied as a function of Hf concentration, and was as high as 520°C at a Hf content of 28.7at%. 2μm thick crystallized films with I0at% or greater Hf were martensitic at room temperature. DSC analysis demonstrated that above 10at%Hf additions... 

Nanoparticle copper/carbon composite films were prepared by co-deposition of RF-Sputtering and RF-PECVD method from acetylene gas and copper target. We investigate deposition process in the region where by changing pressure, the process converts to physical sputtering mode in constant power regime and at a critical pressure between 1.5 to 3 Pa. The estimated value of mean ion energy at this critical point of pressure is close to threshold energy of physical sputtering of copper atoms by acetylene ions. By utilizing this property and by setting initial pressure from 1.3 to 6.6 Pa, nanoparticles copper/carbon composite films were grown with different copper content. The Copper content of our... 

The most challenging requirement for depositing NiTi-based shape memory thin films is the control of film composition because a small deviation can strongly shift the transformation temperatures. This article presents a technique to control film composition via adjustment of the power supplied to the targets during simultaneous sputter deposition from separate Ni, Ti, and X (e.g., Hf) targets. After optimization of sputter parameters such as working gas pressure, target-substrate distance, and target power ratio, binary Ni100-x Tix thin films were fabricated and characterized by energy dispersive x-ray spectroscopy in a scanning electron microscope (to measure the film composition and... 

High temperature shape memory NiTiHf thin films with varying hafnium contents up to 28.7 at.% were fabricated by DC magnetron sputtering using simultaneous sputter deposition from separate elemental targets. The required film composition was achieved by adjusting the power ratio to the targets. The as-deposited films were amorphous; a post deposition annealing was performed at 550 °C to crystallize the films. Two-micron thick films were characterized by energy dispersive spectroscopy in a scanning electron microscope, temperature controlled X-ray diffraction, differential scanning calorimetry, and atomic force microscopy. The results showed that above 10 at.% Hf additions the transformation... 

In this study, pure TiO2 and Au:TiO2 nanocomposite thin films are both synthesized using sol-gel and RF reactive co-sputtering methods. Physical and photoelectrochemical properties of the thin films deposited by each method are compared. The optical density spectra and scanning electron microscopy images of the Au:TiO2 films reveal formation of gold nanoparticles in the all nanocomposite films synthesized by two methods. Moreover, the optical bandgap energy of the thin films decreases with addition of Au nanoparticles. X-ray photoelectron spectroscopy indicates that the presence of gold in metallic state and the formation of TiO2 is stoichiometric. The photoelectrochemical properties of the... 

TixSi1-xO2 compound thin-film systems were deposited by reactive RF magnetron co-sputtering technique. The effect of Ti concentration on the hydrophilicity of TixSi1-xO2 compound thin films was studied and it was shown that the films with Ti0.6Si0.4O2 composition possess the best hydrophilic property among all the grown samples. Surface ratio and average roughness of the thin films were measured by atomic force microscopy (AFM). Surface chemical states and stoichiometry of the films were determined by X-ray photoelectron spectroscopy (XPS). In addition, XPS revealed that the amount of Ti-O-Si bonds in nanometer depth from the surface of the Ti0.6Si0.4O2 films was the maximum, which resulted... 

Local annealing of amorphous NiTi thin films was performed by using an Nd:YAG 1064 nm wavelength pulsed laser beam. Raw samples produced by simultaneous sputter deposition from elemental Ni and Ti targets onto unheated Si (100) and Silica (111) substrates were used for annealing. Delicate treatment with 15.92 W/mm2 power density resulted in crystallization of small spots; while 16.52 and 17.51 W/mm2 power densities caused ablation of the amorphous layer. Optical microscopy, scanning electron microscopy, X-ray diffraction and atomic force microscopy were performed to characterize the microstructure and surface morphology of the amorphous/crystallized spot patterns  

Gold-silver alloy nanoparticles with various Au concentrations in sputtered SiO2 thin films were synthesized by using RF reactive magnetron co-sputtering and then heat-treated in reducing Ar + H2 atmosphere at different temperatures. The UV-visible absorption spectra of the bimetallic systems confirmed the formation of alloy nanoparticles. The optical absorption of the Au-Ag alloy nanoparticles exhibited only one plasmon resonance absorption peak located at 450 nm between the absorption bands of pure Au and Ag nanoparticles at 400 and 520 nm, respectively, for the thin films annealed at 800 °C. The maximum absorption wavelength of the surface plasmon band showed a red shift with increasing... 

We prepared copper-carbon nanocomposite films by co-deposition of RF-Sputtering and RF-PECVD methods at room temperature. These films contain different copper concentration and different size of copper nanoparticles. The copper content of these films was obtained from Rutherford Back Scattering (RBS) analyze. We studied electrical resistivity of samples versus copper content. A metal-nonmetal transition was observed by decreasing of copper content in these films. The electrical conductivity of dielectric and metallic samples was explained by tunneling and percolation models respectively. In the percolation threshold conduction results from two mechanisms: percolation and tunneling. In the...