Search for: stereometric-analysis
Article Surfaces and Interfaces ; Volume 21 , 2020 ; Matos, R. S ; Pinto, E. P ; Rezaee, S ; Mardani, M ; Sharif University of Technology
Elsevier B.V 2020
In this paper, we have successfully deposited Ag-Cu thin films. Nanoscale morphology and nanotexture were studied using atomic force microscopy (AFM) through fractal and stereometric parameters. Additional algorithms have been developed to study new fractal parameters such as surface entropy, fractal succolarity, and fractal lacunarity. The results revealed that as the deposition time increased, films exposed isotropies between ~65 and 82%, which were correlated to the fractal patterns, where from #3 to #5 there were greater spatial complexities. Moreover, surface roughness increased from #1 to #3, which was observed for both Sq and Sa. Similar behavior was exhibited by the other height...
Evaluation of the topographical surface changes of silicon wafers after annealing and plasma cleaning, Article Silicon ; Volume 12, Issue 11 , 2020 , Pages 2563-2570 ; Ţălu, Ş ; Dallaev, R ; Arman, A ; Sobola, D ; Salerno, M ; Sharif University of Technology
Springer Science+Business Media B.V 2020
Purpose: The morphological stability of silicon single crystal wafers was investigated, after performing cleaning surface treatments based on moderate temperature annealing and plasma sputtering. Methods: The wafer surfaces were measured by Tapping mode atomic force microscopy in air, before and after the different treatments. The 3D images were segmented by watershed algorithm identifying the local peaks, and the stereometric parameters were extracted thereof. The analysis of variance allowed to better assess the statistically significant differences. Results: All the resulting quantities were critically discussed. It appeared that the different cleaning treatments affected differently the...
Article Optical and Quantum Electronics ; Volume 52, Issue 5 , 2020 ; Arman, A ; Ţălu, Ş ; Dastan, D ; Luna, C ; Rezaee, S ; Sharif University of Technology
The micromorphology and semiconductor properties of TiO2 thin films growth using different ion beam energies have been finely analyzed using atomic force microscopy (AFM), ultra-violet visible (UV–visible) spectroscopy and stereometric analysis. The AFM measurements and surface stereometric analysis are essential for the accurate characterization of the 3-D surface topographic features and allow the determination of the 3-D surface texture parameters that influence the optical properties of the material. The samples were divided into four groups to discuss the obtained results, according to the ion beam energy applied in the sample preparation. The results obtained from experimental...
Article Journal of Materials Science: Materials in Electronics ; Volume 30, Issue 24 , 2019 , Pages 21185-21198 ; 09574522 (ISSN) ; Alam, M. H ; Dastan, D ; Ziakhodadadian, S ; Shi, Z ; Garmestani, H ; Weidenbach, A. S ; Ţălu, Ş ; Sharif University of Technology
Experimental parameters have direct influences on materials properties and therefore their applications. The effect of plasma power on the properties of cobalt oxide thin films, prepared using plasma-enhanced chemical vapor deposition technique, on stainless steel substrates have been addressed in this paper. The structural, morphological, and compositional properties of these films were investigated by means of X-ray diffraction (XRD), atomic force microscopy (AFM), and X-ray photoelectron spectroscopy (XPS) technique. The XRD patterns demonstrated the growth of polycrystalline Co3O4 thin film with a cubic spinel structure such that the intensity of (511) and (311) peaks increase as the...