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surface-nucleation
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Droplet condensation on chemically homogeneous and heterogeneous surfaces
, Article Journal of Applied Physics ; Volume 120, Issue 12 , 2016 ; 00218979 (ISSN) ; Moosavi, A ; Sharif University of Technology
American Institute of Physics Inc
2016
Abstract
Nucleation and growth of condensing droplets on horizontal surfaces are investigated via a 2-D double distribution function thermal lattice Boltzmann method. First, condensation on completely uniform surface is investigated and different mechanisms which cause dropwise and filmwise condensation are studied. The results reveal the presence of cooled vapor layer instability in the condensation on completely smooth surfaces. In the second step, condensation on chemically heterogeneous surfaces is investigated. Moreover, the effect of non-uniformity in the surface temperature is also studied. The results indicate that the vapor layer instability and the nucleation start from the heterogeneities....
Electrodeposition of Al, Mn, and Al-Mn alloy on aluminum electrodes from molten salt (AlCl3-NaCl-KCl)
, Article Journal of Applied Electrochemistry ; Volume 39, Issue 8 , 2009 , Pages 1297-1303 ; 0021891X (ISSN) ; Maleki, A ; Danaee, I ; Gobal, F ; Mahjani, M. G ; Sharif University of Technology
2009
Abstract
Electrochemical deposition of aluminum and manganese from basic and acidic molten AlCl3-NaCl-KCl mixture on an aluminum electrode at 180 °C was studied by the methods of voltammetry, and potential and current transient. The deposition of aluminum was found to proceed via a nucleation/growth mechanism in basic melt, while the deposition of manganese was found to be diffusion controlled in basic melt. The diffusion coefficient of Mn2+ ions in basic melt, as derived by voltammetry was in agreement with the deductions of transient methods. Analysis of the chronoamperograms indicates that the deposition of manganese on Al was controlled by 3D diffusion controlled nucleation and growth. The...
Electrocrystallization of Pb and Pb assisted Al on aluminum electrode from molten salt (AlCl3-NaCl-KCl)
, Article Journal of Alloys and Compounds ; Volume 478, Issue 1-2 , 2009 , Pages 83-88 ; 09258388 (ISSN) ; Danaee, I ; Maleki, A ; Gobal, F ; Mahjani, M. G ; Sharif University of Technology
2009
Abstract
Electrochemical deposition of aluminum and lead from basic molten AlCl3-NaCl-KCl mixture on an aluminum electrode at 180 °C was studied by the methods of voltammetry, potential and current transient and constant current deposition. The deposition of aluminum was found to proceed via a nucleation/growth mechanism, while the deposition of lead was found to be diffusion controlled. The diffusion coefficient calculated for Pb2+ ions in basic melt by voltammetry was in agreement with the deductions of transient method. The analysis of the chronoamperograms indicates that the deposition process of lead on Al substrates was controlled by 3D diffusion control, nucleation and growth. The processes...