Loading...
Search for:
ultralow-energy-ion-implantation
0.006 seconds
Electrical properties of nanocontacts on silicon nanoparticles embedded in thin SiO2 synthesized by ultralow energy ion implantation
, Article Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures ; Volume 23, Issue 6 , 2005 , Pages 2821-2824 ; 10711023 (ISSN) ; Shalchian, M ; Coffin, H ; Claverie, A ; Grisolia, J ; Dumas, C ; Atarodi, S. M ; Sharif University of Technology
2005
Abstract
In this paper, we present the room temperature current-voltage characteristics of large (100×100 μ m2) and a nanoscale (100×100 nm2) metal-oxide-semiconductor (MOS) capacitor containing few silicon nanocrystals. The layer of silicon crystals is synthesized within the oxide of this capacitor by ultralow energy ion implantation and annealing. Current fluctuations in the form of discrete current steps and sharp peaks are apparent in the static and dynamic I (V) characteristics of the capacitor. These features have been associated to quantized charging and discharging of the nanoparticles and the resulting Coulomb interaction to the tunneling current. © 2005 American Vacuum Society
From continuous to quantized charging phenomena in few nanocrystals MOS structures
, Article 11th International Autumn Meeting on Gettering and Defect Engineering in Semiconductor Technology, GADEST 2005, 25 September 2005 through 30 September 2005 ; Volume 108-109 , 2005 , Pages 25-32 ; 10120394 (ISSN); 9783908451136 (ISBN) ; Shalchian, M ; Grisolia, J ; Bonafos, C ; Atarodi, S. M ; Claverie, A ; Pichaud B ; Claverie A ; Alquier D ; Richter H ; Kittler M ; Richter H ; Kittler M ; Sharif University of Technology
Trans Tech Publications Ltd
2005
Abstract
In this paper, we present a study on the contribution of silicon nanocrystals to the electrical transport characteristics of large (100 µ x 100 µm) and small (100 nm x 100 nm) metaloxide- semiconductor (MOS) capacitors at room temperature. A layer of silicon nanocrystals is synthesized within the oxide of these capacitors by ultra-low energy ion implantation and annealing. Several features including negative differential resistance (NDR), sharp current peaks and random telegraph signal (RTS) are demonstrated in the current-voltage and current-time characteristics of these capacitors. These features have been associated to charge storage in silicon nanocrystals and to the resulting Coulomb...