Control of Elements Ratio in Alloy Deposition System, M.Sc. Thesis Sharif University of Technology ; Rashidian, Bijan (Supervisor)
Abstract
Nowadays, thin film alloy deposition has much importance. These alloys are used for various opto-electronic device applications such as liquid crystal displays, flat panel displays, plasma displays, solar cells and computer memories. Exact control of elements ratio in alloy is one of the important issues in deposition of thin film alloys. In alloy deposition with electron beam gun method from its elements, uniformity improvement of each layer is a way to maintain elements ratio in different parts of sample. This uniformity has much importance especially in optical coatings such as high quality antireflection coatings, highly selective filters and low loss reflectance coatings. In this...
Cataloging briefControl of Elements Ratio in Alloy Deposition System, M.Sc. Thesis Sharif University of Technology ; Rashidian, Bijan (Supervisor)
Abstract
Nowadays, thin film alloy deposition has much importance. These alloys are used for various opto-electronic device applications such as liquid crystal displays, flat panel displays, plasma displays, solar cells and computer memories. Exact control of elements ratio in alloy is one of the important issues in deposition of thin film alloys. In alloy deposition with electron beam gun method from its elements, uniformity improvement of each layer is a way to maintain elements ratio in different parts of sample. This uniformity has much importance especially in optical coatings such as high quality antireflection coatings, highly selective filters and low loss reflectance coatings. In this...
Find in contentBookmark |
|