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Elastic fields of interacting point defects within an ultra-thin fcc film bonded to a rigid substrate

Shodja, H. M ; Sharif University of Technology | 2013

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  1. Type of Document: Article
  2. DOI: 10.2478/s13531-013-0116-7
  3. Publisher: 2013
  4. Abstract:
  5. Certain physical and mechanical phenomena within ultra-thin face-centered cubic (fcc) films containing common types of interacting point defects are addressed. An atomic-scale lattice statics in conjunction with many-body interatomic potentials suitable for binary systems is conducted to analyze the effects of the depth on the: (1) formation energy and layer-by-layer displacements due to the presence of vacancy-octahedral self-interstitial atom (OSIA) ensemble, and (2) elastic fields as well as the free surface shape in the case of vacancy-dopant interaction. Moreover, the effects of the inter-defect spacing for various depths are also examined. To ensure reasonable accuracy and numerical convergence, the atomic interaction up to the second-nearest neighbor is considered
  6. Keywords:
  7. Interacting point defects ; Lattice statics method ; Ultra-thin fcc film
  8. Source: Central European Journal of Engineering ; Volume 3, Issue 4 , 2013 , Pages 707-721 ; 18961541 (ISSN)
  9. URL: http://link.springer.com/article/10.2478%2Fs13531-013-0116-7