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Design and Fabrication of Tip for a Nanolithography System

Tayefeh Younesi, Ali | 2020

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  1. Type of Document: M.Sc. Thesis
  2. Language: Farsi
  3. Document No: 52551 (05)
  4. University: Sharif University of Technology
  5. Department: Electrical Engineering
  6. Advisor(s): Rashidian, Bijan
  7. Abstract:
  8. Various applications of nanostructures in electronics, optoelectronics, MEMS, photonics and plasmonic make their fabrication an interesting research topic recently. Progress in nanotechnology depends on the capability to fabricate, position and interconnect nanometer-scale structures. The development of fabrication devices with nanoscales is mainly dependent on the existence of a suitable nanolithography approach. Patterning materials with nanoscale features aimed at improving integration and device performance faced several challenges. The limitation of conventional lithography systems including resolution related issues, operational costs and lack of flexibility to pattern organic and novel materials have motivated the development of unconventional fabrication methods. Scanning Probe Lithography (SPL), a promising alternative type of lithography for academic research, combines nanoscale feature-size, low technological requirements and the ability to fabricate soft, organic and novel materials. There are different types of SPL which can be categorized with term of the driving mechanisms used in patterning, including thermal, electrical, and mechanical. The similarity between different types of SPL is using a sharp probe to interact with the surface. The resolution of these systems is mainly limited by the shape and size of the probe. Because of that, different probes and fabrication methods have been provided.In this project, different types of tips including Tungsten tips and Silicon tips, compatible with a scratching nanolithography system, are fabricated and the scratching nanolithography system is implemented. To control the distance between the tip and the sample two different mechanisms are used. One is controlling the distance using tunneling current between the tip and sample called STM lithography and the other is controlling the distance by measuring the Sher-Fore between the tip and the sample called AFM lithography
  9. Keywords:
  10. Nanomachines ; Scanning Probe Lithography ; Atomic Force Microscopy (AFM) ; Scanning Probe Microscopy ; Tungsten Tip Fabrication ; Silicon Tip Fabrication ; Scratching Nanolithography

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