Investigation of the structure and electrical properties of strontium titanate thin films growth by pulsed laser deposition method

Dehshali, M. B ; Sharif University of Technology | 2016

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  1. Type of Document: Article
  2. Publisher: Hanyang University , 2016
  3. Abstract:
  4. In this paper, we have studied the properties of SrTiO3 thin films which have been deposited on Si/Ti/Pt substrates using pulsed laser deposition technique. The as-deposited films were annealed at temperature of 700 °C in oxygen environment for 1 h. The surface morphology, crystalline phase and chemical composition of the films were characterized by AFM, XRD and XPS techniques, respectively. The XRD data show that phase transition from amorphous to polycrystalline structure happens and also the lattice constant enhances during annealing process. This enhancement can be related to oxygen vacancies in thin films. The XPS data show partial lack of titanium atoms on the surface. The AFM analysis indicates that the surface quality of the film is relatively good and the film shows a nanograin structure. Also, the change of leakage current of Si/Ti/Pt/STO/Pt capacitors with applied voltage has been investigated. The results show Schottky barrier for this capacitor
  5. Keywords:
  6. Electrical properties ; Pulsed Laser Deposition (PLD) ; SrTiO3 thin films
  7. Source: Journal of Ceramic Processing Research ; Volume 17, Issue 1 , 2016 , Pages 26-29 ; 12299162 (ISSN)