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CVD synthesis of small-diameter single-walled carbon nanotubes on silicon

Arjmandi, N ; Sharif University of Technology | 2009

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  1. Type of Document: Article
  2. Publisher: 2009
  3. Abstract:
  4. A simple process for the chemical vapor deposition of ultra SD single-wall carbon nanotubes has been developed. In this process, an iron nitrate nonahydrate solution in isopropyl alcohol with a concentration of (400 μgr/milt) was used to catalyst nanoparticle formation on an oxidized silicon wafer. The oxide on the substrate was made of a thick layer of wet oxide sandwiched between two thin layers of dry oxide. The process results in semiconducting Single-Walled carbon Nano Tubes (SWNTs) with diameters of less than 0.7 nm and more than a 1 ev band gap energy, which are amongst the smallest diameters of SWNTs ever reported. © Sharif University of Technology, June 2009
  5. Keywords:
  6. Band gap energy ; Catalyst nanoparticle ; CVD synthesis ; Dry oxide ; Iron nitrates ; Isopropyl alcohols ; Oxidized silicon wafers ; Single-walled carbon ; Small-diameter ; Thick layers ; Thin layers ; Chemical vapor deposition ; Semiconducting silicon compounds ; Silicon oxides ; Silicon wafers ; Single-walled carbon nanotubes (SWCN) ; Carbon ; Catalyst ; Nanotechnology ; Silicon ; Substrate
  7. Source: Scientia Iranica ; Volume 16, Issue 1 D , 2009 , Pages 61-64 ; 10263098 (ISSN)
  8. URL: http://scientiairanica.sharif.edu/article_3226.html