Scanning Probe Nanolithography, Implementation and Characterization

, M.Sc. Thesis Sharif University of Technology Mehdi Aghaei, Sadegh (Author) ; Rashidian, Bijan (Supervisor)

Abstract

With the increasing development of the semiconductor industry, the density integration of integrated circuits with affordable expenses has gained a special place between different researches. Nanolithography as a way to decrease the size of patterns has a significant contribution in integration of circuits. Scanning Probe Nanolithography (SPNL) is one of the most important nanolithography methods due to its ability to create patterns with an extremely high resolution and direct patterning. Scanning Near-field Optical Lithography (SNOL) has the advantages of the usage of optic such as non-direct effect on sample and the advantages of scanning systems such as high resolution. In first part of...

Analysis of the Interaction of Electron Beam and External Field by Considering Space Charge Effect and its Application in EBL Nanolithography

, M.Sc. Thesis Sharif University of Technology Farmehini Farahani, Vahid (Author) ; Rashidian, Bizhan (Supervisor) ; Mehrani, Khashayar (Co-Advisor)

Abstract

Due to tremendous growth in usage of electron beams in different applications like VLSI, welding, chemical processes, Polymer industry and medical applications, precise study of these beams is of great importance. One of the most important parameters in studying electron beams characteristics is the phenomenon and effect of space charge. Although in most methods of analyzing electron optical systems, this effect is neglected, however in high density beams, this effect is bold. Space charge effect is due to interaction and electrostatic repulsion force between each of the electrons in the beam, which results in a change in shape and also divergence of beam. It is worth to mention that in...

Design and Implementation of a Scratching Nanolithography System

, M.Sc. Thesis Sharif University of Technology Rezapoor, Pouyan (Author) ; Rashidian, Bijan (Supervisor)

Abstract

Today, in order to reach atomic scale resolution, novel nanolithography methods, known as unconventional nanolithography, have been presented, since conventional methods, including photolithography and scanning beam lithography are fundamentally unable to fulfill this need. In this work, a specific type of unconventional lithography, known as scanning probe lithography, is presented. Scanning probe lithography takes advantage of the interactions between a very sharp probe and the sample in nanoscale distances to control this distance, and hence enable the modification of the sample using this sharp probe. In mechanical scanning probe lithography, the probe is used mechanically to change the...