Modeling and Improving the Thickness Distribution in Vacuum Coating System

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Chaghazardi, Zahra | 2009

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Type of Document: M.Sc. Thesis
Language: Farsi
Document No: 39927 (05)
University: Sharif University of Technology
Department: Electrical Engineering
Advisor(s): Rashidian, Bizhan
Abstract:
In the fabrication of semiconductor devices, uniformity of thin films has many important influences on optical and electrical properties of the device. many attempts have been done on the enhancement of the uniformity of thin films so far. In this thesis, first the effect of angular variation of source with respect to the target on uniformity in the evaporation coating system has been studied, then an in situ positioning system for substrate has been designed and fabricated. After finding the thickness’s profile for Ag and Cu in Electron Beam Gun system, we studied the motion pattern of the target for improving the uniformity. This positioning system can be used to any coating systems. in order To performing this project, the crystal header, which is properly water cooled and has good thermal stability, has been designed and fabricated. The dependence of electron beam current in the coating system to the accelerator voltage and filament current has been explored. Also, the variation of spot size of electron beam upon the accelerator voltage and the distance between the anode and cathode has been studied.
Keywords:
Electron Gun ; Beam Spot Size ; Physical Vapor Deposition ; Vacuum Deposition ; Thin Film Uniformity

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