Simulation and Optimization of CVD based on CFD

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Raoofi Jahromi, Iman | 2015

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Type of Document: M.Sc. Thesis
Language: Farsi
Document No: 46871 (06)
University: Sharif University of Technology
Department: Chemical and Petroleum Engineering
Advisor(s): Farhadi, Fathollah; Bozorg Mehri, Ramin
Abstract:
In this project, the steady laminar flow coupled with heat transfer and chemical reactions corresponding to metal organic chemical vapor deposition (MOCVD) process in an axis-symmetrical rotating disk reactor has been simulated based on computational fluid dynamics (CFD) approach to optimize the parameters affecting the thickness of layer deposition. The simulation results have been validated with the benchmark solutions obtained from the literatures for the corresponding cases study. By genetic algorithms five geometrical structures have been optimized to achieve minimal radial changes in the rate of deposition. Using the optimum values, radial variations deposition rate of 22.7% decreased to 2.63%
Keywords:
Computational Fluid Dynamics (CFD) ; Transport Phenomena ; Chemical Reactions ; Simulation ; Optimization ; Chemical Vapor Deposition (CVD)

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