Design and Implement of Gas Distribution and Control System for Deposition of Nano-Structure through NFCVD

Please enable javascript in your browser.

Ahmadi, Zabihollah | 2017

549 Viewed

Type of Document: M.Sc. Thesis
Language: Farsi
Document No: 49560 (05)
University: Sharif University of Technology
Department: Electrical Engineering
Advisor(s): Rashidian, Bizhan
Abstract:
For realization of nanosale photonic device required by the future system, electron beams, and scanning probe microscopes have been used to control the site on the subtrate. However, these techniques have a fatal disadvantage because they cannot deal with insulators and Diffraction of light, limiting their application.To overcome this difficulties, we design and implement near-field optical chemical vapor deposition, which enables the fabrication of nanometer-scale structure, while controlling their position. To guarantee that an optical near field is generated sufficiently, we fabricated a sharped W-tip by electrochemical etching. The separation between the W-tip and the substrate was kept within a few micrometers by our designed positioner. As the optical source, we setup 80 W CO2 laser with 10.6 um wavelength. In our system, the number of MFC which is used is 8 and this allows fabrication of different material simultaneously. At the end, we growth CNT on the apex of W-tip by near-field Optical CVD.
Keywords:
Chemical Vapor Deposition (CVD) ; Near Field ; Nanostructure ; Nanostructures Deposition

No TOC