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Characterization of Plasma Etching Process Using Plasmonic Structures

Arian, Kiarash | 2022

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  1. Type of Document: M.Sc. Thesis
  2. Language: Farsi
  3. Document No: 55858 (05)
  4. University: Sharif University of Technology
  5. Department: Electrical Engineering
  6. Advisor(s): Rashidian, Bizhan
  7. Abstract:
  8. plasma characterization has become an essential tool for characterization of etching process in fabrication of nano-electronic devices. The existing methods, such as Langmuir probe and interferometry, have shown drawbacks including disturbing the plasma and sensitivity to mechanical and thermal stability of the measuring systems. In recent years, due to the scale down of microelectronic devices and increase of their sensitivity to disturbance in the plasma etching process, a demand for measuring methods offering less disturbance has arisen. Plasmonic structures, owing to their unprecedented field enhancement and confinement, have been extensively studied. Their sub-wavelength dimensions, allows disturbance-free characterization of plasma. Furthermore, plasmonic resonance dependence to their surrounding changes, allows enhanced sensitivity to the plasma parameters measured utilizing these structures, hence enhancing the performance and accuracy of such sensors. Research conducted on plasma-plasmonic systems is limited and, as of yet, only a few plasma-plasmonic structures has been reported. Modeling of systems having both plasma and plasmonic devices is a challenging task considering the possibility of having systems consisting of electrodes, propagating waves, and electron space charges and thus requires a Multiphysics description of the problem. The objective of this thesis has been preparation of a simulation platform able to tackle the plasma-plasmonic simulations as well as investigating the opportunities of plasmonic-enhanced plasma characterization techniques. Plasma-plasmonic coupled structures have been modeled using COMSOL Multiphysics, and have been validated based on the results of other particle-in-cell codes, showing the adequacy of the described methods utilized. Also, challenges within other modeling platforms including implementation of electrodes, modeling of small semiconductor and metallic nanoparticles, and simulation of charged plasmonic devices among the others has been addressed in this thesis, making the described model a universal simulation tool to simulate plasma-plasmonic structures
  9. Keywords:
  10. Plasma ; Simulation ; COMSOL Software ; PLasmonic Structure ; Characterization

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