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    Optimization of Nanostructures for Electron Emission

    , Ph.D. Dissertation Sharif University of Technology Yasrebi, Navid (Author) ; Rashidian, Bizhan (Supervisor)
    Abstract
    The need for better characterization systems (electron microscopes) and high resolution lithography systems, have made electron beams systems an interesting choice for research and development. In fact, all of the above applications require ideal electron beams (beams with minimum energy spread, maximum current density, and minimum spotsize), and electron-optic lenses (simple lenses with minimum aberration). In this research, theoretical aspects of electron emission and lens systems are reviewed. Field emission array (FEA) electron guns are introduced as electron sources with minimum energy spread, and a new simulation method is presented in order to minimize the complexity, and reduce the... 

    Investigation & Analysis of Lens-like Effects in Nano Metallic Meshes

    , M.Sc. Thesis Sharif University of Technology Rohani, Ali (Author) ; Rashidian, Bijan (Supervisor) ; Mehrany, Khashayar (Supervisor)
    Abstract
    Charged particle lenses perform two types of operations. One purpose of lenses is to confine a beam, or maintain a constant or slowly varying radius. This is important in high-energy accelerators where particles must travel long distances through a small bore.A second function of lenses is to focus beams or compress them to the smallest possible radius. If the particles are initially parallel to the axis, a linear field lens aims them at a common point. Focusing leads to high particle flux or a highly localized beam spot. Focusing is important for applications such as scanning electron microscopy, ion microprobes, and ion-beam-induced inertial fusion. All modern lenses, have fully metal... 

    Analysis of the Interaction of Electron Beam and External Field by Considering Space Charge Effect and its Application in EBL Nanolithography

    , M.Sc. Thesis Sharif University of Technology Farmehini Farahani, Vahid (Author) ; Rashidian, Bizhan (Supervisor) ; Mehrani, Khashayar (Co-Advisor)
    Abstract
    Due to tremendous growth in usage of electron beams in different applications like VLSI, welding, chemical processes, Polymer industry and medical applications, precise study of these beams is of great importance. One of the most important parameters in studying electron beams characteristics is the phenomenon and effect of space charge. Although in most methods of analyzing electron optical systems, this effect is neglected, however in high density beams, this effect is bold. Space charge effect is due to interaction and electrostatic repulsion force between each of the electrons in the beam, which results in a change in shape and also divergence of beam. It is worth to mention that in...