Sharif Digital Repository

The effect of substrate temperature on epitaxial growth of Y1Ba2Cu3O7−x film deposited on (100) crystalline lanthanum aluminate (LAO) substrates by RF Sputtering method has been investigated. The crystal mismatch between film and substrate is about 1.6%. The sputtering was carried out in vacuum with base pressure better than 10−5 Torr and 10/20 Pa oxygen/argon partial pressures. Substrate temperature at this condition is about 730 °C based on Bormann–Hammond diagram. As well known, because of the small lattice mismatch between YBCO and LAO, fabricated thin films are not perfectly c-axis and there is tendency to form a/b-axis regions in the film. Due to substantial effects of the density and... 

In this article, we have studied the properties (especially water repellency) of cotton coated by a thin layer of aluminum. The process has been performed in a low temperature plasma medium, using a magnetron sputtering device. We have also investigated the effect of different gases such as argon and oxygen as the discharge medium on the properties of the obtained samples. The results which are exposure time dependent show a good repellent property for 30 min of treating in argon medium under the condition of our experiment. However, when O2 is used in the system, the cotton property changes to become hydrophilic of which the factor decreases as we increase the time of treating. © 2006... 

High temperature shape memory NiTiHf thin films with varying hafnium contents up to 28.7 at.% were fabricated by DC magnetron sputtering using simultaneous sputter deposition from separate elemental targets. The required film composition was achieved by adjusting the power ratio to the targets. The as-deposited films were amorphous; a post deposition annealing was performed at 550 °C to crystallize the films. Two-micron thick films were characterized by energy dispersive spectroscopy in a scanning electron microscope, temperature controlled X-ray diffraction, differential scanning calorimetry, and atomic force microscopy. The results showed that above 10 at.% Hf additions the transformation... 

In this work, formation of gold nanoparticles in radio frequency (RF) reactive magnetron co-sputtered Au-SiO 2 thin films post annealed at different temperatures in Ar + H 2 atmosphere has been investigated. Optical, surface topography, chemical state and crystalline properties of the prepared films were analyzed by using UV-visible spectrophotometry, atomic force microscopy (AFM), X-ray photoelectron spectroscopy (XPS) and X-ray diffractometry (XRD) techniques, respectively. Optical absorption spectrum of the Au-SiO 2 thin films annealed at 800 °C showed one surface plasmon resonance (SPR) absorption peak located at 520 nm relating to gold nanoparticles. According to XPS analysis, it was... 

We have investigated the effect of bias voltage on sheet resistance, surface roughness and surface coverage of Co/NiO x magnetic bilayer. In addition, interface topography and corrosion resistance of the Ta/Co/Cu/Co/NiO x /Si(1 0 0) system have been studied for Co layers deposited at an optimum bias voltage. Atomic force microscopy (AFM) and four point probe sheet resistance (Rs) measurement have been used to determine surface and electrical properties of the sputtered Co layer at different bias voltages ranging from 0 to -80 V. The Co/NiO x bilayer exhibits a minimum surface roughness and low sheet resistance value with a maximum surface coverage at Vb=-60 V resulted in a slight increase of... 

Thin films of Fe73.1Cu1Nb3.1Si14.7B8.2 alloy with 200, 500, and 800 nm thicknesses have been deposited by RF sputtering. Their magnetic properties have been characterized using Alternating Gradient Field Magnetometer (AGFM) and Vibrating Sample Magnetometer (VSM). The effects of residual stresses investigated by nanoindentation experiments were conducted on the as-deposited samples. It is observed that the coercivity of as-deposited films is inversely proportional to the thickness in relation with the residual stress induced during sputtering. © 2017 Sharif University of Technology. All rights reserved  

In this study, we have used a low temperature plasma, produced by a DC magnetron sputtering device, for decolorizing of denim fabrics, and the effect of using different gases such as Argon and Oxygen as the discharge medium have been investigated. The results obtained under equal periods of time have been compared and the effect of washing on the treated denims has been reported. © 2006 Elsevier B.V. All rights reserved  

This study aims at investigating the effect of the substrate material on growth mechanism and also microstructure of Ta2O5 thin films. For this purpose, atomic force microscopy, scanning electron microscopy, and interferometry analyses were implemented to reveal the influence of silicon wafer and amorphous BK7 glass substrates on the nucleation and growth mechanisms of Ta2O5 thin films deposited via the radio frequency magnetron sputtering technique. Results indicated that those films with finer morphologies had relatively higher nucleation densities. Compared with BK7 glass substrate, crystals formed on the silicon wafer were shown to be finer and had lower mean areas in more nucleation... 

To investigate the Ta/Co/Cu/Co/NiO/Si(100) spin valve structure, fabrication and characterization of the Cu/Co/NiO/Si(100) system was studied for further understanding the structure. The system was grown by employing combinative DC sputtering-evaporation technique. Nickel oxide with a thickness of about 30 nm was deposited on Si(100) substrate using thermal evaporation technique.The cobalt film, then, with a thickness of about 3 nm was grown by DC sputtering under various applied negative bias voltages ranging from 0 to - 80 V. The optimum bias voltage (Vb = -60 V) for the growth of Co layer was determined by atomic force microscopy (AFM), four-point probe sheet measurement (Rs) and scanning... 

Investigation of BSCCO 2223 phase formation in superconducting thin films of Bi-based cuprates deposited on MgO substrate is reported. A series of films were made by in situ dc-magnetron sputtering method and another series were made by ex situ rf-magnetron sputtering technique. Same target have been used in both technique. In the case of the ex situ method, the films were annealed for different period of time at 800°C, and in the case of in situ method, the films were deposited at different temperature substrate. The influence of annealing time and the temperature of the substrate on the quality and the phase formation for ex situ and in situ method have studied, respectively. The results... 

This study aims at investigating the effect of the substrate material on growth mechanism and also microstructure of Ta2O5 thin films. For this purpose, atomic force microscopy, scanning electron microscopy, and interferometry analyses were implemented to reveal the influence of silicon wafer and amorphous BK7 glass substrates on the nucleation and growth mechanisms of Ta2O5 thin films deposited via the radio frequency magnetron sputtering technique. Results indicated that those films with finer morphologies had relatively higher nucleation densities. Compared with BK7 glass substrate, crystals formed on the silicon wafer were shown to be finer and had lower mean areas in more nucleation... 

In this work, we compared formation and properties of heat-treated Ag nanoparticles in silica matrix synthesized by RF- reactive magnetron cosputtering and sol-gel methods separately. The sol-gel and sputtered films were annealed at different temperatures in air and in a reduced environment, respectively. The optical UV-visible Spectrophotometry have shown that the absorption peak appears at 456 and 400 nm wavelength indicating formation of silver nanoparticles in SiO2 matrix for both the sol -gel and sputtering methods at 100 and 800 °C, respectively. XPS measurements showed that the metallic Ag0 nanoparticles can be obtained from both the techniques at these temperatures. According to XPS... 

Indium tin oxide (ITO) thin films have been deposited using RF sputtering technique at different pressures, RF powers, and substrate temperatures. Variations in surface morphology, optical properties, and film resistances were measured and analyzed. It is shown that a very low value of sheet resistance (1.96 ω/sq.) can be achieved with suitable arrangement of the deposition experiments. First, at constant RF power, deposition at different pressure values is done, and the condition for achieving minimum sheet resistance (26.43 ω/sq.) is found. In the next step, different values of RF powers are tried, while keeping the pressure fixed on the previously found minimum point (1-2 Pa). Finally,... 

In this research, titanium dioxide (TiO2) ultra-thin films have been successfully obtained on lamina-glass substrates by thermal oxidation of DC magnetron sputtered titanium. The as-deposited and the annealed films have been characterized by different techniques. The X-ray diffraction (XRD) results revealed the amorphous structure of as-deposited titanium and anatase crystal structure for the annealed films. The atomic force microscopy (AFM) results showed that increasing the annealing temperature could lead to rougher and larger grain size in the films. Finally, the optical data and band-gap calculations of the films were obtained using the transmittance spectrum, indicating that... 

The effect on the thermal parameters of superconducting transition-edge bolometers produced on a single crystalline SrTiO3 (STO) substrate with and without a CeO2 buffer layer was investigated. Metal-organic deposition was used to deposit the 20-nm CeO2 buffer layer, whereas RF magnetron sputtering was applied to fabricate 150-nm-thick superconducting YBa2Cu3O7-δ (YBCO) thin film. The critical transition temperature for both of the YBCO films was 90 K, and the transition width was ∼1.9 K. The bolometers fabricated from these samples were characterized with respect to the voltage phase and amplitude responses, and the results were compared with that of simulations conducted by applying a... 

In this study, pure TiO2 and Au:TiO2 nanocomposite thin films are both synthesized using sol-gel and RF reactive co-sputtering methods. Physical and photoelectrochemical properties of the thin films deposited by each method are compared. The optical density spectra and scanning electron microscopy images of the Au:TiO2 films reveal formation of gold nanoparticles in the all nanocomposite films synthesized by two methods. Moreover, the optical bandgap energy of the thin films decreases with addition of Au nanoparticles. X-ray photoelectron spectroscopy indicates that the presence of gold in metallic state and the formation of TiO2 is stoichiometric. The photoelectrochemical properties of the... 

Formation and thermal stability of nanothickness NiSi layer in Ni(Pt 4 at.%)/Si(1 0 0) and Ni0.6Si0.4(Pt 4 at.%)/Si(1 0 0) structures have been investigated using magnetron co-sputtering deposition method. Moreover, to study the effect of Si substrate in formation of NiSi and its thermal stability, we have used Ta diffusion barrier between the Ni0.6Si0.4 layer and the Si substrate. Post annealing treatment of the samples was performed in an N2 environment in a temperature range from 200 to 900 °C for 2 min. The samples were analyzed by four point probe sheet resistance (Rs) measurement, X-ray diffraction (XRD) and atomic force microscopy (AFM) techniques. It was found that the annealing... 

In this paper, the effect of plasma sputtering treatment on the natural dyeing properties of wool and the possibility of substituting it for mordant treatment have been studied. We used madder and weld as natural dyes and copper sulfate (CuSO4) as a metal mordant. We also used, copper as the electrode material, in a DC magnetron plasma sputtering device. The color strength of samples was analyzed using a Reflective Spectrophotometer and washing and light fastnesses were investigated according to I.S.O. standard recommendations. The results show that, the color strength and fastness of dyed wool samples have been improved after plasma treatment. The antibacterial counting test was also used... 

In planar perovskite solar cells (PSCs), engineering the extraction and recombination of electron–hole pairs by modification of the electron transport layer (ETL)/perovskite interface is very vital for obtaining high performance. The main idea here is to improve properties of the TiO2/perovskite interface by inserting an ultra-thin layer (UTL) of WO3 or SnO2 with the thickness of less than 10 nm by RF magnetron sputtering method. The structural and electrical characteristics of the samples were tested by XRD, AFM, FE-SEM, Mott-Schottky analysis, UV–Vis spectroscopy, J-V characterization and electrochemical impedance spectroscopy (EIS). It was found that the bilayer structured ETLs exhibit...