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    Synthesis of Tin and Ti2n Nanostructured Coatings on Ti alloys Using Magnetron Sputtering System And Comparison of Their Biocompatibility Properties

    , M.Sc. Thesis Sharif University of Technology Kalantari Saghafi, Mahsa (Author) ; Nemati, Ali (Supervisor) ; Khamse, Sara (Supervisor)
    Abstract
    Considering the importance of biocompatibility of implantable prothesis’, metallic alloys have weaker corrosion resistance than ceramics. In order to extend usage of nanomaterials to improve the bio-properties of materials, Nano-structured ceramic coatings are being suggested to improve corrosion resistance and biocompatibility of prosthesis. Meanwhile, very good properties of TiN, such as corrosion resistance and mechanical properties as a thin film coating are undeniable. In this study, TiN and Ti2N thin film were deposited on Ti-based substrate, using PVD and Magnetron sputtering at different argon to nitrogen ratio. The crystal structure of the films was examined using Grazing XRD... 

    Deposition of Nanoporous Metallic Thin Films by Sputtering and Comparing with Electrochemical Method (Electroplating)

    , M.Sc. Thesis Sharif University of Technology Monjezi, Hossein (Author) ; Rashidian, Bijan (Supervisor)
    Abstract
    Porous thin films have becom very atractive due to their applications in many types of electronic and optical devices. There are several methods for deposition of such films. Chemical method for deposition of nanoporous thin films are relatively simple, but usually hard to control. In this thesis, chemical deposition of thin porous Molybden films is reported. In addition, an available sputtering system has been modified and, controlled porosity thin films were then deposited on glass and silicon substrates using GLAD method.These films have been characerized, and compared with chemically deposited porous thin films  

    Design and Optimization of RSFQ Based Digital SQUID for High Sensitive Measurement of Widely Varying Magnetic Fields

    , Ph.D. Dissertation Sharif University of Technology Foroughi, Farshad (Author) ; Fardmanesh, Mehdi (Supervisor)
    Abstract
    Analog SQUIDs have limited slew rate and dynamic range and these problems make it hard to operate SQUID systems in unshielded applications like Bio-magnetic imaging and NDE. Recently by combining analog SQUIDs and RSFQ Logic, new class of magnetic sensors are introduced. These sensors have an acceptable sensitivity and very high dynamic range. On the other hand these sensors, Which are called Digital SQUIDs, can be directly connected to digital signal processing stages. In This work, for first time, a digital SQUID completely based on i-directional RSFQ was designed and optimized. using Bi-directional RSFQ, one can significantly simplify the digital SQUID circuit design and therefore... 

    Fabrication and Characterization of Electron Transport and Buffer Layer Thin Films, Employing Sputtering Method, for All-Oxide Solar Cells

    , M.Sc. Thesis Sharif University of Technology Farahani, Elham (Author) ; Iraji zad, Azam (Supervisor) ; Mohammadpour, Raheleh (Co-Advisor)
    Abstract
    In this study, transparent conductive thin film of Aluminum doped ZnO (ZnO:Al) have been fabricated thorough RF sputtering. The main goal of fabrication of these layers is achieving thin films with minimum resistivity and maximum optical transparency in visible range of spectrum employing as transparent electrodes and buffer layer at the entirely oxidized solar cells. To achieve the suitable structure, various parameters including pressure, power and the thickness of the deposition and annealing on morphologies of thin film has been investigated. According to these results, thin film of ZnO:Al has the transparency of 80% in the visible light range . Doping of ZnO with Aluminum caused... 

    Fabrication, Characterization and Field Emission Study of GLAD Tungsten Nanostructures

    , M.Sc. Thesis Sharif University of Technology Shaker, Tayebeh (Author) ; Moshfegh, Alireza (Supervisor) ; Azimirad, Ruhollah (Supervisor)
    Abstract
    Recently nanostructure materials have used in various technologies and hence an extensive part of research focused on preparing and optimization of growth of nanostructure materials. Usually common procedure is based on a two-step process. First, construction a pre-layer by means of different deposition methods and then formation a nanostructure with a thermal treatment which increases the cost of research. Hence with one step method such as glancing angle deposition (GLAD ( it is possible to form a desirable structure with low cost. In this research Nano columns of tungsten was deposited on Si(133) by means of GLAD-RF sputtering without any heat treatment at substrate rotational speed ( )... 

    Fabrication and Characterization of Patterned Carbon Nanotubes Network on the Silicon Wafer, by Plasma Enhanced Chemical Vapor Deposition

    , M.Sc. Thesis Sharif University of Technology Zaimbashi, Mohsen (Author) ; Rashidian, Bijan (Supervisor)
    Abstract
    Carbon nanotubes, due to their extraordinary electronic and physical properties, have attracted much attention in the last decade. Some of their potential applications are in CNT-field effect transistor, field emission devices, physical and chemical sensors, micro and Nanoelectromechanical systems and Nano antenna. In this thesis, we have first reviewed some features of carbon nanotubes and the advantages of PECVD method compared with thermal CVD. In the second part the role of some of the materials (such as H2/NH3/C2H4) in CNT growth are studied. We created a square pattern on the silicon wafer by photolithography. Afterwards, titanium and nickel deposition is done on the mentioned pattern.... 

    Design and Construction of a Sputter Ion Pump

    , M.Sc. Thesis Sharif University of Technology Bazrafshan, Gholamreza (Author) ; Vosoughi, Naser (Supervisor) ; Rahighi, Javad (Supervisor)
    Abstract
    Design and construction process of special kind of sputter ion pump is described briefly in this paper. In order to investigate the optimization of effective parameters in choosing and designing ILSF ion pumps, this pump has been designed and manufactured. By optimizing some parameters such as dimension and shape of penning cells, anode voltage, magnetic field and internal structure of pump, it is possible to significantly decrease the cost of construction and operation of synchrotron vacuum system. By using the results of simulations and calculations of electromagnetic field, plasma simulation or glow discharge, titanium sputtering, etc., critical parameters in design of internal structure... 

    Deposition and Analysis of Indium-Tin-Oxide NanoStructures Using Sputtering

    , M.Sc. Thesis Sharif University of Technology Bagheri, Behrang (Author) ; Rashidian, Bijan (Supervisor)
    Abstract
    Transparent conductive materials have been widely used in semiconductor technology. Among them all, Indium tin oxide (ITO) has been utilized as electrodes in liquid crystal displays, solar cells, heat reflecting films and gas sensors.In general, the desired properties of transparent conductive oxides are high conductance and transmission. However, due to the complexity of ITO molecular structure, the film properties strongly depend on the depositon parameters.In first part of this thesis, physical properties and electrical characteristic of ITO films, different deposition techniques, and effects of deposition parameters (substrate temperature, pressure, power, etc. ) on film properties are... 

    Synthesis, Characterization and Field Emission Study of Nickel Oxide (NiOX) Nanostructures

    , M.Sc. Thesis Sharif University of Technology Ebrahimi, Mahdi (Author) ; Moshfegh, Alireza (Supervisor) ; Sangpour, Parvane (Supervisor)
    Abstract
    Recently, nickel oxide nanostructures with NaCl-type structure have a variety of applications due to excellent chemical stability, as well as optical, electrical and magnetic properties. In this research, first by using DC and RF sputtering methods,nickel thin films were deposited on Si (100) and glass lame substrates under different experimental conditions (Discharge power, pressure and growth time).The deposited layers were annealed in air at different temperatures to obtain and compare their crystalline structures. Nickel oxide nanostructures grown on the Si (100) were studied by scanning electron microscopy analysis (SEM) to determines surface morphology, atomic force microscopy (AFM)... 

    Optimization of sputtering parameters for the deposition of low resistivity indium tin oxide thin films

    , Article Acta Metallurgica Sinica (English Letters) ; Vol. 27, issue. 2 , Apr , 2014 , p. 324-330 Yasrebi, N ; Bagheri, B ; Yazdanfar, P ; Rashidian, B ; Sasanpour, P ; Sharif University of Technology
    Abstract
    Indium tin oxide (ITO) thin films have been deposited using RF sputtering technique at different pressures, RF powers, and substrate temperatures. Variations in surface morphology, optical properties, and film resistances were measured and analyzed. It is shown that a very low value of sheet resistance (1.96 ω/sq.) can be achieved with suitable arrangement of the deposition experiments. First, at constant RF power, deposition at different pressure values is done, and the condition for achieving minimum sheet resistance (26.43 ω/sq.) is found. In the next step, different values of RF powers are tried, while keeping the pressure fixed on the previously found minimum point (1-2 Pa). Finally,... 

    Physical properties of sputtered amorphous carbon coating

    , Article Journal of Alloys and Compounds ; Volume 513 , 2012 , Pages 135-138 ; 09258388 (ISSN) Yari, M ; Larijani, M. M ; Afshar, A ; Eshghabadi, M ; Shokouhy, A ; Sharif University of Technology
    Abstract
    In this study the effect of deposition temperature and thickness on the physical properties of carbon films deposited by magnetron sputtering PVD was investigated. The results of Raman spectra and grazing incidence XRD (GIXRD) patterns show that the graphitization increases by increasing the deposition temperature. There is a change in deposition mechanism at 400 °C from amorphous carbon deposition to nano-structured graphite deposition. Also by increasing substrate temperature the electrical resistance of carbon films reduces significantly up to 300 °C and then remains largely constant. High intrinsic compressive stress in low temperature deposited carbon films causes cracks and... 

    Evaluation of the topographical surface changes of silicon wafers after annealing and plasma cleaning

    , Article Silicon ; Volume 12, Issue 11 , 2020 , Pages 2563-2570 Stach, S ; Ţălu, Ş ; Dallaev, R ; Arman, A ; Sobola, D ; Salerno, M ; Sharif University of Technology
    Springer Science+Business Media B.V  2020
    Abstract
    Purpose: The morphological stability of silicon single crystal wafers was investigated, after performing cleaning surface treatments based on moderate temperature annealing and plasma sputtering. Methods: The wafer surfaces were measured by Tapping mode atomic force microscopy in air, before and after the different treatments. The 3D images were segmented by watershed algorithm identifying the local peaks, and the stereometric parameters were extracted thereof. The analysis of variance allowed to better assess the statistically significant differences. Results: All the resulting quantities were critically discussed. It appeared that the different cleaning treatments affected differently the... 

    Adhesion modification of polyethylenes for metallization using radiation-induced grafting of vinyl monomers

    , Article Surface and Coatings Technology ; Volume 201, Issue 16-17 , 2007 , Pages 7519-7529 ; 02578972 (ISSN) Shojaei, A ; Fathi, R ; Sheikh, N ; Sharif University of Technology
    2007
    Abstract
    The present paper demonstrates the performance of the radiation grafting technique as a chemically based surface pretreatment method to adhesion modification of polyethylene surfaces toward the metallic layer. Gamma irradiation over a dose range of 4-10 kGy is used for grafting of vinyl monomers including acrylamide (AAm) and 1-vinyl-2-pyrrolidone (NVP) onto the surface of three different polyethylenes including low density polyethylene (LDPE) and two kinds of high density polyethylenes, namely HDPE-1 and HDPE-2. The grafting yield is evaluated based on the weight increase of the samples. It is found that the grafting yield is dominated by the crystallinity of the polyethylene, so that lower... 

    The effects of thickness on magnetic properties of FeCuNbSiB sputtered thin films

    , Article Scientia Iranica ; Volume 24, Issue 6 , 2017 , Pages 3521-3525 ; 10263098 (ISSN) Shivaee, H. A ; Celegato, F ; Tiberto, P ; Castellero, A ; Baricco, M ; Hosseini, H. R. M ; Sharif University of Technology
    Abstract
    Thin films of Fe73.1Cu1Nb3.1Si14.7B8.2 alloy with 200, 500, and 800 nm thicknesses have been deposited by RF sputtering. Their magnetic properties have been characterized using Alternating Gradient Field Magnetometer (AGFM) and Vibrating Sample Magnetometer (VSM). The effects of residual stresses investigated by nanoindentation experiments were conducted on the as-deposited samples. It is observed that the coercivity of as-deposited films is inversely proportional to the thickness in relation with the residual stress induced during sputtering. © 2017 Sharif University of Technology. All rights reserved  

    Optical properties, microstructure, and multifractal analyses of ZnS thin films obtained by RF magnetron sputtering

    , Article Journal of Materials Science: Materials in Electronics ; Volume 31, Issue 7 , 2020 , Pages 5262-5273 Shakoury, R ; Arman, A ; Ţălu, Ş ; Ghosh, K ; Rezaee, S ; Luna, C ; Mwema, F ; Sherafat, K ; Salehi, M ; Mardani, M ; Sharif University of Technology
    Springer  2020
    Abstract
    The morphology, structure and optical properties of zinc sulfide (ZnS) thin films prepared through radio-frequency (RF) magnetron sputtering have been analyzed using atomic force microscopy (AFM), UV–Vis–NIR spectrophotometry, X-ray diffraction, and multifractal analyses. The X-ray diffraction patterns revealed that all ZnS thin films show a single peak at around 29.6°, which has been ascribed to the (111) planes of sphalerite phase, indicating that the growth direction of the films is the [111] direction. UV–Vis–NIR transmittance spectra were used to determine the refractive index of the samples, their thickness, and their band gap energy, showing the optical and semiconductor properties a... 

    Aluminum coatings on cotton fabrics with low temperature plasma of argon and oxygen

    , Article Surface and Coatings Technology ; Volume 201, Issue 9-11 SPEC. ISS , 2007 , Pages 5646-5650 ; 02578972 (ISSN) Shahidi, S ; Ghoranneviss, M ; Moazzenchi, B ; Anvari, A ; Rashidi, A ; Sharif University of Technology
    2007
    Abstract
    In this article, we have studied the properties (especially water repellency) of cotton coated by a thin layer of aluminum. The process has been performed in a low temperature plasma medium, using a magnetron sputtering device. We have also investigated the effect of different gases such as argon and oxygen as the discharge medium on the properties of the obtained samples. The results which are exposure time dependent show a good repellent property for 30 min of treating in argon medium under the condition of our experiment. However, when O2 is used in the system, the cotton property changes to become hydrophilic of which the factor decreases as we increase the time of treating. © 2006... 

    Characterization of sputtered NiTi shape memory alloy thin films

    , Article Scientia Iranica ; Volume 16, Issue 3 B , 2009 , Pages 248-252 ; 10263098 (ISSN) Sanjabi, S ; Naderi, M ; Zare Bidaki, H ; Sadrnezhaad, Kh ; Sharif University of Technology
    2009
    Abstract
    During recent years, many investigations have been carried out to determine how to select different materials for the making of Micro Electro Mechanical Systems (MEMS) and bio-MEMS. The NiTi shape memory alloy thin film has been much regarded as a promising candidate for MEMS due. to its unique shape memory effect and high energy output. In this research, NiTi thin film was fabricated using a sputtering technique from separate elemental Ni and Ti targets. The characterizations of the deposited films were, investigated using different analysis techniques, such as Field Emission SEM, DSC, XR.D, electrical resistivity measurement and nanoindentation. © Sharif University of Technology, June 2009... 

    High temperature NiTiHf shape memory thin films fabricated by simultaneous sputter deposition from elemental targets

    , Article International Conference on Shape Memory and Superelastic Technologies, SMST-2006, Pacific Grove, CA, 7 May 2006 through 11 May 2006 ; 2008 , Pages 315-322 ; 9780871708625 (ISBN) Sanjabi, S ; Sadrnezhaad, .Kh ; Barber, Z. H ; Sharif University of Technology
    2008
    Abstract
    NiTiHf thin films with varying hafnium contents up to 28.7at% were fabricated using simultaneous sputter deposition from separate Ni, Ti, and Hf targets onto unheated substrates. The required film composition was achieved by adjusting the power ratio to the targets. The as-deposited films were amorphous; and post deposition annealing was performed at 550°C, slightly above their crystallization temperatures. The crystallization temperature of the films varied as a function of Hf concentration, and was as high as 520°C at a Hf content of 28.7at%. 2μm thick crystallized films with I0at% or greater Hf were martensitic at room temperature. DSC analysis demonstrated that above 10at%Hf additions... 

    Sputter alloying of Ni, Ti and Hf for fabrication of high temperature shape memory thin films

    , Article Materials Science and Technology ; Volume 23, Issue 8 , 2007 , Pages 987-991 ; 02670836 (ISSN) Sanjabi, S ; Sadmezhaad, K ; Barber, Z. H ; Sharif University of Technology
    2007
    Abstract
    In the present paper, the fabrication and characterisation of typical high temperature Ni(Ti+ Hf) alloyed thin films produced by simultaneous sputter deposition from separate elemental Ni, Ti and Hf targets are presented. Film composition, determined by energy dispersive X-ray spectroscopy, was controlled by adjusting the ratio of powers applied to each target. Films deposited at room temperature had an amorphous structure and subsequent annealing at 550°C was carried out in a high vacuum environment, based on crystallisation temperature evaluation by differential scanning calorimetry (DSC). High temperature martensitic transformation, confirmed by DSC and variable temperature X-ray... 

    Growth and characterization of TixNi1-x shape memory thin films using simultaneous sputter deposition from separate elemental targets

    , Article Thin Solid Films ; Volume 491, Issue 1-2 , 2005 , Pages 190-196 ; 00406090 (ISSN) Sanjabi, S ; Sadrnezhaad, S. K ; Yates, K. A ; Barber, Z. H ; Sharif University of Technology
    2005
    Abstract
    The fabrication of TixNi1-x shape memory films using simultaneous magnetron sputtering from two separate, elemental targets was investigated. The films were deposited at room temperature and then annealed at 500 °C to achieve the shape memory effect. The influence of sputtering parameters such as power ratio to the targets (to control the composition) and Ar gas pressure (to control the film structure) were studied. It was found that the Ar gas pressure had a critical influence on the shape memory effect of the films. Characterization of the films was carried out by energy dispersive X-ray spectroscopy in a scanning electron microscope (to measure the film composition and uniformity), in...