Loading...

Theoretical model for visible light saturable absorber nanolithography

Tofighi, S ; Sharif University of Technology | 2012

995 Viewed
  1. Type of Document: Article
  2. DOI: 10.1088/2040-8978/14/12/125004
  3. Publisher: 2012
  4. Abstract:
  5. In this paper a saturable absorber medium is employed as an optical limiter to reduce the spot size to the range of several tens of nanometres. The characteristics of a Gaussian beam are theoretically analysed upon propagation through the saturable absorber medium. Based on Maxwell equations a system of coupled nonlinear ordinary differential equations for intensity, beam radius and beam curvature is obtained. Theoretical analyses and numerical results show that the behaviour of a Gaussian beam in a saturable absorber medium strongly depends on the initial characteristics of the laser beam. Numerical results indicate that, depending on the initial conditions and a suitable saturable absorber thickness, a desirable nano-spot size can be obtained. Also, under suitable initial conditions there are possibilities to achieve nanometric spot sizes with laser intensity less than saturation intensity
  6. Keywords:
  7. Nano-lithography ; Saturable absorber ; Visible light ; Beam radius ; Initial conditions ; Laser intensities ; Nanometres ; Nanometrics ; Nonlinear ordinary differential equation ; Numerical results ; Optical limiters ; Saturation intensity ; Spot sizes ; Theoretical models ; Gaussian beams ; Maxwell equations ; Nanolithography ; Ordinary differential equations ; Saturable absorbers
  8. Source: Journal of Optics (United Kingdom) ; Volume 14, Issue 12 , 2012 ; 20408978 (ISSN)
  9. URL: http://iopscience.iop.org/article/10.1088/2040-8978/14/12/125004/meta