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Design and Implementation of a Scratching Nanolithography System

Rezapoor, Pouyan | 2020

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  1. Type of Document: M.Sc. Thesis
  2. Language: Farsi
  3. Document No: 52550 (05)
  4. University: Sharif University of Technology
  5. Department: Electrical Engineering
  6. Advisor(s): Rashidian, Bijan
  7. Abstract:
  8. Today, in order to reach atomic scale resolution, novel nanolithography methods, known as unconventional nanolithography, have been presented, since conventional methods, including photolithography and scanning beam lithography are fundamentally unable to fulfill this need. In this work, a specific type of unconventional lithography, known as scanning probe lithography, is presented. Scanning probe lithography takes advantage of the interactions between a very sharp probe and the sample in nanoscale distances to control this distance, and hence enable the modification of the sample using this sharp probe. In mechanical scanning probe lithography, the probe is used mechanically to change the structure of the sample. These interactions are either tunneling current, shear force, and electromagnetic forces in the near-field. Depending on which interaction to measure and control the tip-sample distance, there are three different methods of scanning probe lithography. In this work, two different systems are designed and implemented, which use the first two mentioned interactions, tunneling current and shear forces, to control the tip-sample distance. The first one is known as scanning tunneling lithography, where the surface of a photoresist is nanoscratched. In the second method, known as atomic force lithography, these forces are measured and controlled using a tip attached to a quartz tuning fork. A scratching resolution of 100 nanometers is achieved on a photoresist, using scanning tunnelin lithography, and on aluminum surface, using atomic force lithography
  9. Keywords:
  10. Nanoscratch ; Nanolithography ; Scanning Probe Lithography ; Scanning Tunneling Lithography ; Atomic Force Lithography

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