Control of Elements Ratio in Alloy Deposition System

Kishani Farahani, Esmat | 2009

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  1. Type of Document: M.Sc. Thesis
  2. Language: Farsi
  3. Document No: 39979 (05)
  4. University: Sharif University of Technology
  5. Department: Electrical Engineering
  6. Advisor(s): Rashidian, Bijan
  7. Abstract:
  8. Nowadays, thin film alloy deposition has much importance. These alloys are used for various opto-electronic device applications such as liquid crystal displays, flat panel displays, plasma displays, solar cells and computer memories. Exact control of elements ratio in alloy is one of the important issues in deposition of thin film alloys. In alloy deposition with electron beam gun method from its elements, uniformity improvement of each layer is a way to maintain elements ratio in different parts of sample. This uniformity has much importance especially in optical coatings such as high quality antireflection coatings, highly selective filters and low loss reflectance coatings. In this thesis, the purpose is to improve uniformity in deposited alloy with electron beam gun method which leads to control of elements ratio in different parts of the sample. At the first we acquire thickness profile of copper and silver. Then, by designing and fabricating of a system to determine sample position in situ, we acquire a suitable movement pattern to improve uniformity for each element. Then we deposit alloys with better control of their elements ratio in different parts of the sample. In addition to, design and fabrication of crystal header with good thermal stability, obtaining relation between beam current with accelerating voltage and cathode current, design and fabrication of sample holder with ability to set in different angles, improvement of vacuum system, and repairing and modifying of interferometer are the other works that have been done during this project.
  9. Keywords:
  10. Alloy ; Thickness Profile Monitoring ; Physical Vapor Deposition ; Elements Ratio Control ; Electron Beam Gun

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