Deposition and Analysis of Indium-Tin-Oxide NanoStructures Using Sputtering

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Bagheri, Behrang | 2011

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Type of Document: M.Sc. Thesis
Language: Farsi
Document No: 41340 (05)
University: Sharif University of Technology
Department: Electrical Engineering
Advisor(s): Rashidian, Bijan
Abstract:
Transparent conductive materials have been widely used in semiconductor technology. Among them all, Indium tin oxide (ITO) has been utilized as electrodes in liquid crystal displays, solar cells, heat reflecting films and gas sensors.In general, the desired properties of transparent conductive oxides are high conductance and transmission. However, due to the complexity of ITO molecular structure, the film properties strongly depend on the depositon parameters.In first part of this thesis, physical properties and electrical characteristic of ITO films, different deposition techniques, and effects of deposition parameters (substrate temperature, pressure, power, etc. ) on film properties are investigated. After that, ITO thin films are fabricated using sputtering method in different deposition conditions. Morphology and electrical properties of the films are analyzed. Finally, methods of ITO nanostructure depotision are shown, and corresponding nanostructures are grown using electrophoresis deposition and Sol-gel method. Morphology of Nanostructures is analyzed
Keywords:
Conductivity ; Transparency ; Nanostructure ; Sol-Gel Method ; Sputtering ; Deposition ; Indium Tin Oxide (ITO)Nanostructure

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