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Analysis of the Interaction of Electron Beam and External Field by Considering Space Charge Effect and its Application in EBL Nanolithography

Farmehini Farahani, Vahid | 2011

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  1. Type of Document: M.Sc. Thesis
  2. Language: Farsi
  3. Document No: 41720 (05)
  4. University: Sharif University of Technology
  5. Department: Electrical Engineering
  6. Advisor(s): Rashidian, Bizhan; Mehrani, Khashayar
  7. Abstract:
  8. Due to tremendous growth in usage of electron beams in different applications like VLSI, welding, chemical processes, Polymer industry and medical applications, precise study of these beams is of great importance. One of the most important parameters in studying electron beams characteristics is the phenomenon and effect of space charge. Although in most methods of analyzing electron optical systems, this effect is neglected, however in high density beams, this effect is bold. Space charge effect is due to interaction and electrostatic repulsion force between each of the electrons in the beam, which results in a change in shape and also divergence of beam. It is worth to mention that in relatively high energies, some sort of attractive force causes the beam to converge toward axis. This phenomenon is due to magnetic force caused by current of electrons inside the beam. In this thesis, an intro on fundamentals of electron optical beams and effect of external fields on the behavior of beam is followed by a comprehensive analysis of space charge effect based on numerical methods. A conclusion of this thesis is a study on design and operation of EBL Nano lithographic systems considering space charge effect.
  9. Keywords:
  10. Simulation ; Electron Optical System ; Electrostatic Lens ; Space Charges ; Nanolithography ; Electron Beam ; Finite Integration Method ; Electron Beam Lithography (EBL)

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