Loading...

Scanning Probe Nanolithography, Implementation and Characterization

Mehdi Aghaei, Sadegh | 2013

763 Viewed
  1. Type of Document: M.Sc. Thesis
  2. Language: Farsi
  3. Document No: 44276 (05)
  4. University: Sharif University of Technology
  5. Department: Electrical Engineering
  6. Advisor(s): Rashidian, Bijan
  7. Abstract:
  8. With the increasing development of the semiconductor industry, the density integration of integrated circuits with affordable expenses has gained a special place between different researches. Nanolithography as a way to decrease the size of patterns has a significant contribution in integration of circuits. Scanning Probe Nanolithography (SPNL) is one of the most important nanolithography methods due to its ability to create patterns with an extremely high resolution and direct patterning. Scanning Near-field Optical Lithography (SNOL) has the advantages of the usage of optic such as non-direct effect on sample and the advantages of scanning systems such as high resolution. In first part of this thesis, different methods of nanolithography implementation, operation principle of Scanning Near-field Optical Microscopy (SNOM), and fabrication methods of this microscope’s probe are studied. In the second part of the thesis, according to the facilities in Micro-Technology and Nano-electronic laboratory (MT lab), the apertureless fiber optic probes are fabricated. In the next step, according to available instructions a layer of photoresist with appropriate thickness are coated on silicon substrate and then Nano patterns are patterned using of scanning probe. Initial characterization is done using Shear Force Microcopy (SFM) immediately after pattering. After development of the photoresist, the Nano patterns are investigated using SEM and then the effect of scan speed variation and repetition number in pattern’s width and depth are investigated. The minimum width of 33 nm is achieved by this process. This line is one of thinnest lines that are reported until now by this method
  9. Keywords:
  10. Probe ; Nanolithography ; Scanning Near-Field Optical Microscope (SNOM) ; Photoresist Mask

 Digital Object List

 Bookmark

No TOC