Loading...

Fabrication and Characterization of Patterned Carbon Nanotubes Network on the Silicon Wafer, by Plasma Enhanced Chemical Vapor Deposition

Zaimbashi, Mohsen | 2014

791 Viewed
  1. Type of Document: M.Sc. Thesis
  2. Language: Farsi
  3. Document No: 46836 (05)
  4. University: Sharif University of Technology
  5. Department: Electrical Engineering
  6. Advisor(s): Rashidian, Bijan
  7. Abstract:
  8. Carbon nanotubes, due to their extraordinary electronic and physical properties, have attracted much attention in the last decade. Some of their potential applications are in CNT-field effect transistor, field emission devices, physical and chemical sensors, micro and Nanoelectromechanical systems and Nano antenna. In this thesis, we have first reviewed some features of carbon nanotubes and the advantages of PECVD method compared with thermal CVD. In the second part the role of some of the materials (such as H2/NH3/C2H4) in CNT growth are studied. We created a square pattern on the silicon wafer by photolithography. Afterwards, titanium and nickel deposition is done on the mentioned pattern. In the next step, lift-off process is performed. Then, to create nickel Nano islands, wafers are annealed in the hydrogen plasma at 480 °C. In the last step, growth of carbon nanotubes is done in the ethylene/hydrogen plasma at the temperature of 400 °C. Also, according to the SEM images of the wafers, the effects of the catalyst thickness and plasma power on growth process are investigated; and Field emission of carbon nanotubes is measured by a system, assembled in our lab. Synthesized carbon nanotubes are suitable for CNT-field effect transistors channel and bio sensing applications
  9. Keywords:
  10. Carbon Nanotubes ; Lithography ; Catalyst ; Plasma Enhanced Chemical Vapor Deposition (PECVD) ; Photoresist Mask ; Sputtering ; Chemical Etching ; Plasma Annealing

 Digital Object List

 Bookmark

No TOC