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Property change during nanosecond pulse laser annealing of amorphous NiTi thin film

Sadrnezhaad, S. K ; Sharif University of Technology | 2012

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  1. Type of Document: Article
  2. DOI: 10.1007/s12034-012-0293-7
  3. Publisher: 2012
  4. Abstract:
  5. Nanosecond lasers of different intensities were pulsed into sputter-deposited amorphous thin films of near equiatomic Ni/Ti composition to produce partially crystallized highly sensitive R-phase spots surrounded by amorphous regions. Scanning electron microscopy having secondary and back-scattered electrons, field emission scanning electron microscopy, optical microscopy and X-ray diffraction patterns were used to characterize the laser treated spots. Effect of nanosecond pulse lasering on microstructure, morphology, thermal diffusion and inclusion formation was investigated. Increasing beam intensity and laser pulse-number promoted amorphous to R-phase transition. Lowering duration of the pulse incidence reduced local film oxidation and film/substrate interference
  6. Keywords:
  7. Thin film ; Amorphous regions ; Amorphous thin films ; Backscattered electrons ; Beam intensity ; Field emission scanning electron microscopy ; Film oxidation ; Highly sensitive ; Inclusion formation ; Laser treated ; Lasering ; Nanosecond lasers ; Nanosecond pulse ; Nanosecond pulse lasers ; NiTi ; NiTi thin films ; Property changes ; Pulse laser ; R phase ; SMA ; Crystallization ; Field emission microscopes ; Interference suppression ; Optical microscopy ; Scanning electron microscopy ; Thin films ; X ray diffraction ; Pulsed lasers
  8. Source: Bulletin of Materials Science ; Volume 35, Issue 3 , 2012 , Pages 357-364 ; 02504707 (ISSN)
  9. URL: http://link.springer.com/article/10.1007%2Fs12034-012-0293-7