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Physical properties of sputtered amorphous carbon coating

Yari, M ; Sharif University of Technology

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  1. Type of Document: Article
  2. DOI: 10.1016/j.jallcom.2011.10.006
  3. Abstract:
  4. In this study the effect of deposition temperature and thickness on the physical properties of carbon films deposited by magnetron sputtering PVD was investigated. The results of Raman spectra and grazing incidence XRD (GIXRD) patterns show that the graphitization increases by increasing the deposition temperature. There is a change in deposition mechanism at 400 °C from amorphous carbon deposition to nano-structured graphite deposition. Also by increasing substrate temperature the electrical resistance of carbon films reduces significantly up to 300 °C and then remains largely constant. High intrinsic compressive stress in low temperature deposited carbon films causes cracks and delaminating in carbon films
  5. Keywords:
  6. Electrical resistance ; Amorphous carbon coating ; Carbon deposition ; Carbon thin films ; Deposition mechanism ; Deposition temperatures ; Electrical resistances ; Grazing incidence ; Low temperatures ; Nano-structured ; Substrate temperature ; XRD ; Amorphous carbon ; Amorphous films ; Deposition ; Electric resistance ; Graphite ; Magnetron sputtering ; Physical properties ; Raman scattering ; Raman spectroscopy ; Carbon films
  7. Source: Journal of Alloys and Compounds ; Volume 513 , 2012 , Pages 135-138 ; 09258388 (ISSN)
  8. URL: http://www.sciencedirect.com/science/article/pii/S0925838811019608